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The deposition of silicon from silane in a low-pressure hot-wall system

✍ Scribed by W.A.P. Claassen; J. Bloem; W.G.J.N. Valkenburg; C.H.J. Van Den Brekel


Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
590 KB
Volume
57
Category
Article
ISSN
0022-0248

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A silicon nitride Ðlm was deposited on an Si(100) substrate with a silicon dioxide surface layer from and NH 3 by low-pressure chemical vapour deposition under various conditions. The etching rates of the silicon SiH 2 Cl 2 nitride Ðlms by bu †ered hydroΓ‘uoric acid (BHF) were investigated using Ruth