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Chemical vapour deposition of silicon under reduced pressure in a hot-wall reactor: Equilibrium and kinetics

✍ Scribed by Francis Langlais; François Hottier; Robert Cadoret

Publisher: Elsevier Science
Year: 1982
Tongue: English
Weight: 965 KB
Volume: 56
Category: Article
ISSN: 0022-0248
DOI: 10.1016/0022-0248(82)90051-3

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