Microstructure and growth rate of chemical vapour deposited TiN films in a vertical cold wall reactor

✍ Scribed by Noboru Yoshikawa; Atsushi Kikuchi

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 710 KB
• Volume: 130
• Category: Article
• ISSN: 0022-0248
• DOI: 10.1016/0022-0248(93)90547-a