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The behavior of incorporated impurities in tantalum anodic oxide films at the dielectric breakdown

✍ Scribed by Fumihiro Arifuku; Hiroshi Yoneyama; Hideo Tamura

Publisher: Elsevier Science
Year: 1980
Tongue: English
Weight: 334 KB
Volume: 25
Category: Article
ISSN: 0013-4686
DOI: 10.1016/0013-4686(80)90039-0

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