Plasma-assisted chemical vapour depositi
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K.-T. Rie; A. Gebauer
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Article
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1991
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Elsevier Science
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English
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In this work the use of two metallo-organic compounds, titanium tetrakisdialkylamides, was investigated with a pulsed d.c. plasma-assisted chemical vapour deposition process to deposit layers on steel substrates and hard metals. The layers have been studied by scanning electron microscopy X-ray diff