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Temperature increase during formation of anodic films on tantalum

✍ Scribed by J. Zahavi; J. Yahalom

Publisher
Elsevier Science
Year
1971
Tongue
English
Weight
896 KB
Volume
16
Category
Article
ISSN
0013-4686

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πŸ“œ SIMILAR VOLUMES

The formation of anodic oxide films on t
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The anodic films formed on tantalum in many non-aqueous solutions have been found to consist of two layers. Next to the metal there is a layer of Ta206 with the same characteristics as that of films formed in aqueous electrolytes, while between the TaeOb film and the solution there is a layer which

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## Ahstract -After heating the anodic oxide tilm on tantalum, a constant current or voltage was applied to the specimen in a diluted phosphoric acid solution. and the transient behaviour was examined according to the Frcnkel defect model. Interstitial ions taking part in ionic conduction are captu

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The breakdown phenomena during formation of non-porous anodic films on Al. Tq Nb and Zr are investigated. The effect of the current density, the composition and concentration of the electrolyte and the nature of the anodized metal on the features of electric breaking down and on the value of the bre