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Anodic growth of passive films on niobium and tantalum

✍ Scribed by Sverre Hornkjøl

Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
359 KB
Volume
36
Category
Article
ISSN
0013-4686

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The variations of the equivalent parallel resistance and capacitance of anodic films formed on Ta and Nb in varying concentrations of H2SO4 suggest that the volume of film formed per coulomb is much greater in 100)~, acid, although the dielectric constant is substantially unchanged. The field requir