✦ LIBER ✦

Temperature effects of Si interface passivation layer deposition on high-k III-V metal-oxide-semiconductor characteristics

✍ Scribed by Ok, InJo; Kim, H.; Zhang, M.; Zhu, F.; Park, S.; Yum, J.; Zhao, H.; Lee, Jack C.

Book ID: 127375546
Publisher: American Institute of Physics
Year: 2007
Tongue: English
Weight: 384 KB
Volume: 91
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2790780

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Metal-oxide-semiconductor capacitors on

Metal-oxide-semiconductor capacitors on GaAs with high-k gate oxide and amorphous silicon interface passivation layer

✍ Koveshnikov, S.; Tsai, W.; Ok, I.; Lee, J. C.; Torkanov, V.; Yakimov, M.; Oktyab 📂 Article 📅 2006 🏛 American Institute of Physics 🌐 English ⚖ 352 KB

Observations in trapping characteristics

Observations in trapping characteristics of positive bias temperature instability on high-k/metal gate n-type metal oxide semiconductor field effect transistor with the complementary multi-pulse technique

✍ J.C. Liao; Y.K. Fang; Y.T. Hou; W.H. Wu; C.L. Hung; P.F. Hsu; K.C. Lin; K.T. Hua 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 493 KB

[IEEE 2010 17th IEEE International Sympo

[IEEE 2010 17th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA 2010) - Singapore, Singapore (2010.07.5-2010.07.9)] 2010 17th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits - Reliability and breakdown characteristics of HfO2-based GaAs metal-oxide-semiconductor capacitors with a thin Si interface layer

✍ Das, T.; Mahata, C.; Dalapati, G.K; Chi, D.; Sutradhar, G.; Bose, P.K.; Maiti, C 📂 Article 📅 2010 🏛 IEEE ⚖ 361 KB