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Temperature dependent low energy electron microscopy study of Ge growth on Si(1 1 3)

✍ Scribed by T. Clausen; Th. Schmidt; J.I. Flege; A. Locatelli; T.O. Mentes; S. Heun; F.Z. Guo; J. Falta


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
381 KB
Volume
252
Category
Article
ISSN
0169-4332

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Single-crystal Ge 1 Γ€ x Sn x alloys (x ΒΌ 0.025, 0.052, and 0.078) with diamond cubic structure have been grown on Si(0 0 1) substrates by molecular beam epitaxy (MBE), using high-quality Ge thin films as buffer layers. The Ge 1 Γ€ x Sn x alloys are nearly fully strained and have high crystalline qual