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Flattening of low temperature epitaxial Ge1−xSnx/Ge/Si(1 0 0) alloys via mass transport during post-growth annealing

✍ Scribed by Wei Wang; Shaojian Su; Jun Zheng; Guangze Zhang; Chunlai Xue; Yuhua Zuo; Buwen Cheng; Qiming Wang

Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 948 KB
Volume: 257
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2010.12.094

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Flattening of low temperature epitaxial Ge1−xSnx/Ge/Si(1&#xa0;0&#xa0;0) alloys via mass transport during post-growth annealing

Flattening of low temperature epitaxial Ge1−xSnx/Ge/Si(1 0 0) alloys via mass transport during post-growth annealing