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Temperature dependence of the reaction of NO with CFCl2CH2O2 and CH3CFClO2 radicals

✍ Scribed by Fuxiang Wu; Robert W. Carr

Publisher: John Wiley and Sons
Year: 1996
Tongue: English
Weight: 729 KB
Volume: 28
Category: Article
ISSN: 0538-8066
DOI: 10.1002/(sici)1097-4601(1996)28:1<9::aid-kin2>3.0.co;2-z

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✦ Synopsis

The reaction of NO with the peroxy radical CFC12CH202, and with CH3CFClO2 was investigated at 8-20 torr and 263-321 K by UV flash photolysis of CFCI2CH3/O2/NO gas mixtures The kinetics were determined from observations of the growth rate of the CFC12CH20 radical and the decay rate of NO by time-resolved mass spectrometry The temperature dependence of the bimolecular rate coefficients, with their statistical uncertainties, can be expressed as (2.9 ? 0.7) e(43s'96)'T X lo-" cm3 molecule-l s -' , or (1.3 2 0.2) (T/300)-'1.5'"2' X lo-" cm3 molecule-' s-' for NO + CFCI2CH2O2, and (3.3 t 0.6)e'5'6'731'T X lo-" cm3 molecule-' s-I, or (2.0 i-0.3) (T/300)-"8'0~') X lo-'' cm3 molecule-' s-' for NO + CHlCFC102 No pressure dependence of the rate coefficients could be detected over the 8-20 torr range investigated.

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