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TEM analysis of InGaAs/InAlAs epitaxial layers grown over InP patterned substrates

✍ Scribed by F. Peiro; A. Cornet; J.R. Morante; K. Zekentes; A. Georgakilas


Book ID
119125409
Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
942 KB
Volume
21
Category
Article
ISSN
0167-577X

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πŸ“œ SIMILAR VOLUMES


SIMS analysis of InP, GaAs and InGaAs la
✍ Y. Gao; S. Godefroy; J. L. Benchimol; F. Alaoui; F. Alexandre; K. Rao πŸ“‚ Article πŸ“… 1990 πŸ› John Wiley and Sons 🌐 English βš– 364 KB

## Abstract SIMS analysis was applied to the characterization of InP, GaAs and InGaAs grown by chemical beam expitaxy (CBE). It includes the control of purity and doping, and the determination of growth rate and matrix composition. Some important characteristics of CBE growth, such as carbon incorp