System for measurement of the development parameters of electron beam resists
β Scribed by Atsushi Sekiguchi; Keiichi Tajima; Toshiharu Matsuzawa; Masaaki Kurihara
- Publisher
- John Wiley and Sons
- Year
- 2001
- Tongue
- English
- Weight
- 317 KB
- Volume
- 84
- Category
- Article
- ISSN
- 8756-663X
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## Abstract In this paper, we study the mathematical model of electron beam focusing system where __a__>0,__b__β©Ύ0 are constants, find conditions for the existence of positive Οβperiodic solution of the above equation by using analytical method and comparison theory, and prove the existence of pos
## Synopsis .A new method of evaluation of the effect of electron beam on the latent changes in degrading polymer resists has been developed on the base of measurement of the developing curve under an interference microscope. An evaluation procedure using the unit parameters (film thickness and de