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Synthesis of ZnO nanowalls on Al2O3(0001) by catalyst-free metalorganic chemical vapor deposition

✍ Scribed by Jae Young Park; Dong Ju Lee; Young Su Yun; Yong Sung Hong; Byung-Teak Lee; Jong Ha Moon; Sang Sub Kim


Publisher
TechnoPress
Year
2005
Tongue
English
Weight
417 KB
Volume
11
Category
Article
ISSN
1598-9623

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## Abstract We have deposited indium oxide (In~2~O~3~) films on silicon substrates by the metal organic chemical vapor deposition (MOCVD). We have investigated the effect of substrate temperature on growth and structural properties of films in the range of 200–300 Β°C. The films had a preferred orie