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Synthesis of III–V semiconductor nitrides by reactive cathodic sputtering

✍ Scribed by N Puychevrier; M Menoret

Publisher
Elsevier Science
Year
1976
Tongue
English
Weight
170 KB
Volume
36
Category
Article
ISSN
0040-6090

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✍ G. Meunier; J.P. Manaud; P. Grall 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 354 KB

Thin films of titanium hydride were obtained by reactive cathodic sputtering with a titanium target using different compositions of a mixture of hydrogen and argon as sputtering gas. The layered material is quite different from the bulk material: only a poorly crystallized phase with formula Till,.