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Synthesis and characterization of low pressure chemically vapor deposited titanium nitride films using TiCl4 and NH3

✍ Scribed by N Ramanuja; R.A Levy; S.N Dharmadhikari; E Ramos; C.W Pearce; S.C Menasian; P.C Schamberger; C.C Collins


Book ID
117357046
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
367 KB
Volume
57
Category
Article
ISSN
0167-577X

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