Synthesis and characterization of a positive-working, aqueous-base-developable photosensitive polyimide precursor
β Scribed by Steve Lien-Chung Hsu; Po-I Lee; Jinn-Shing King; Jyh-Long Jeng
- Publisher
- John Wiley and Sons
- Year
- 2002
- Tongue
- English
- Weight
- 202 KB
- Volume
- 86
- Category
- Article
- ISSN
- 0021-8995
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π SIMILAR VOLUMES
The contrast was misreported in the original article. The correct contrast is 2.3, not 7.8, as first stated.
A positive-working photosensitive polyimide precursor based on fluorinated poly(amic acid) (FPAA) and 2,3,4-tris(1-oxo-2-diazonaphthoquinon-4-ylsulfonyloxy-)benzophenone (D4SB) as a photosensitive compound has been developed. FPAA was prepared by ring-opening polyaddition of dianhydrides, pyromellit
## Abstract A novel positiveβworking photosensitive polyimide (PSPI) based on a poly(hydroxyimide) (PHI), a crosslinking agent having vinyl ether groups, and a photoacid generator (PAG) was prepared. The PHI as a base resin of the threeβcomponent PSPI was synthesized from 4,4β²βoxydiphthalic anhydri
An aqueous base-soluble polyimide (BAPAF/6FDA) was obtained from the polycondensation of 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane (BAPAF) and 4,4 -(hexafluoroisopropylidene) -bis(phthalic anhydride (6FDA). It exhibits high thermal stability and high transparency at 365 nm. A novel positive