Positive-working aqueous base developable photosensitive polybenzoxazole precursor/organoclay nanocomposites

Synthesis and characterization of a posi

Synthesis and characterization of a positive-working, aqueous-base-developable photosensitive polyimide precursor

✍ Steve Lien-Chung Hsu; Po-I Lee; Jinn-Shing King; Jyh-Long Jeng 📂 Article 📅 2002 🏛 John Wiley and Sons 🌐 English ⚖ 202 KB 👁 1 views

Novel positive-working aqueous-base deve

Novel positive-working aqueous-base developable photosensitive polyimide precursors based on diazonaphthoquinone-capped polyamic esters

✍ Steve Lien-Chung Hsu; Po-I Lee; Jinn-Shing King; Jyh-Long Jeng 📂 Article 📅 2003 🏛 John Wiley and Sons 🌐 English ⚖ 135 KB

A positive-working photosensitive alkali

A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound

✍ H. Seino; A. Mochizuki; O. Haba; M. Ueda 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 57 KB 👁 1 views

The contrast was misreported in the original article. The correct contrast is 2.3, not 7.8, as first stated.

A positive-working photosensitive alkali

A positive-working photosensitive alkaline-developable polyimide with a highly dimensional stability and low dielectric constant based on poly(amic acid) as a polyimide precursor and diazonaphthoquinone as a photosensitive compound

✍ Hiroshi Seino; Amane Mochizuki; Osamu Haba; Mitsuru Ueda 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 212 KB 👁 1 views

A positive-working photosensitive polyimide precursor based on fluorinated poly(amic acid) (FPAA) and 2,3,4-tris(1-oxo-2-diazonaphthoquinon-4-ylsulfonyloxy-)benzophenone (D4SB) as a photosensitive compound has been developed. FPAA was prepared by ring-opening polyaddition of dianhydrides, pyromellit