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Synchrotron X-ray diffraction studies of silicon implanted with high-energy Ar ions after thermal annealing

✍ Scribed by W. Wierzchowski; K. Wieteska; J. Auleytner; W. Graeff; D. Żymierska

Book ID: 116598069
Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 386 KB
Volume: 382
Category: Article
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2004.05.026

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