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Surface roughness control by energy shift in deep X-ray lithography

✍ Scribed by Y. Cheng; C.-N. Chen; C.-C. Chieng; F. G. Tseng; J. T. Sheu

Publisher: Springer-Verlag
Year: 2003
Tongue: English
Weight: 127 KB
Volume: 9
Category: Article
ISSN: 0946-7076
DOI: 10.1007/s00542-002-0202-x

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