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Adhesion problems in deep-etch x-ray lithography caused by fluorescence radiation from the plating base

✍ Scribed by F.J. Pantenburg; J. Chlebek; A. El-Kholi; H.-L. Huber; J. Mohr; H.K. Oertel; J. Schulz


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
477 KB
Volume
23
Category
Article
ISSN
0167-9317

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