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Surface morphology of a Si(310) substrate used for molecular beam epitaxy of CdHgTe: II. Si(310) surface annealed in As4vapors

✍ Scribed by M. V. Yakushev; D. V. Brunev; K. N. Romanyuk; Yu. G. Sidorov

Book ID: 110202919
Publisher: Pleiades Publishing
Year: 2008
Tongue: English
Weight: 425 KB
Volume: 2
Category: Article
ISSN: 1027-4510
DOI: 10.1134/s1027451008030208

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