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Surface Chemistry in the Atomic Layer Deposition of TiN Films from TiCl 4 and Ammonia

✍ Scribed by Tiznado, Hugo; Zaera, Francisco

Book ID
127370829
Publisher
American Chemical Society
Year
2006
Tongue
English
Weight
294 KB
Volume
110
Category
Article
ISSN
0022-3654

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Atomic Layer Deposition of Epitaxial and
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✍ J. Sundqvist; A. Tarre; A. Rosental; A. HΓ₯rsta πŸ“‚ Article πŸ“… 2003 πŸ› John Wiley and Sons 🌐 English βš– 409 KB πŸ‘ 1 views

## Abstract Thin films of SnO~2~ have been successfully deposited by atomic layer deposition (ALD) using the SnI~4~/O~2~ precursor combination. Depositions were carried out in the temperature range 400–750 °C on SiO~2~/Si(100) and single‐crystalline α‐Al~2~O~3~(012) substrates. The films were found