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Suppression of Ge surface segregation during Si molecular beam epitaxy by atomic and molecular hydrogen irradiation

โœ Scribed by Kiyokazu Nakagawa; Akio Nishida; Yoshinobu Kimura; Toshikazu Shimada


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
452 KB
Volume
150
Category
Article
ISSN
0022-0248

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