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Superconformal filling of 41 nm trenches with Cu electroless deposition on Au-activated self-assembled monolayer

โœ Scribed by W.K. Han; G.H. Hwang; S.J. Hong; H.H. An; C.S. Yoon; J.H. Kim; M.J. Lee; G. Hong; K.S. Park; S.G. Kang


Book ID
113783633
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
533 KB
Volume
123
Category
Article
ISSN
0254-0584

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Electrical properties of sub-100 nm
โœ A. Inberg; E. Glickman; T. Asher; N. Fishelson; Y. Shacham-Diamand ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 589 KB

Self-assembled organic monolayers (SAMs) are good coupling agents and diffusion barriers at Cu/SiO 2 and Cu/ low-k interfaces and are considered therefore as important elements of future all-wet ULSI metallization with sub-45 nm Cu deposited by electroless plating (ELD). We formed SAM of 3-aminoprop