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Substrate temperature dependence of SiH concentration in silane plasmas for amorphous silicon film deposition

✍ Scribed by Yuichiro Asano; Douglas S. Baer; Ronald K. Hanson

Book ID: 119443983
Publisher: Elsevier Science
Year: 1987
Tongue: English
Weight: 378 KB
Volume: 94
Category: Article
ISSN: 0022-3093
DOI: 10.1016/s0022-3093(87)80254-5

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