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Relative Hydrogen Content in Plasma-Enhanced CVD Silicon Nitride Films: Substrate Temperature Dependence and Effect of Thermal Annealing

✍ Scribed by Ling, C. H. ;Kwok, C. Y. ;Prasad, K.

Book ID: 105378415
Publisher: John Wiley and Sons
Year: 1985
Tongue: English
Weight: 213 KB
Volume: 89
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.2210890154

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