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Study on mechanism of etching in low pressure radio-frequency plasmas

โœ Scribed by Zhong-Ling Dai; Guang Yue; You-Nian Wang

Book ID
113514097
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
338 KB
Volume
11
Category
Article
ISSN
1567-1739

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Growth mechanism of electron density in
Growth mechanism of electron density in radio frequency afterglow plasmas
โœ Yasunori Ohtsu; Koji Shimizu; Hiroharu Fujita ๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 251 KB

## Abstract Temporal evolutions of electrons have been investigated on extinction process in radio frequency (RF) afterglow plasmas using various gases. The electron density was found to increase just after the RF power was switched off, and then decayed. This density growth depended on the gas pre