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Study of the influence of oxygen on the composition of thin films obtained by r.f. sputtering from a Ca5(PO4)3 OH target

✍ Scribed by K. van Dijk; J. Verhoeven; C.H.M. Marée; F.H.P.M. Habraken; J.A. Jansen

Book ID
108389131
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
511 KB
Volume
304
Category
Article
ISSN
0040-6090

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The effects of argon pressure and the solute element on compositional changes have been studied in binary Co-early transition metal (ETM) thin films fabricated by r.f. magnetron sputtering using the composite target mode. The solute concentration of the deposited film increases linearly with the are