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Study of the influence of Ar on the formation of diamond-like bonds in films obtained from CH4+Ar, RF plasma deposition

✍ Scribed by M Maharizi; N Croitoru; A Seidman

Book ID
117145192
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
432 KB
Volume
289
Category
Article
ISSN
0022-3093

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## Abstract Plasma enhanced chemical vapour deposition technique (PECVD) was used to grow diamond‐like carbon films using pure methane gas plasma. Structural, optical and mechanical properties of the obtained a‐C:H films were investigated as a function of bias voltage in the range 120–270 V, using