Study of the Effects of Mg and Be Co-Doping in GaN Layers
✍ Scribed by Naranjo, F.B. ;S�nchez-Garc�a, M. A. ;Pau, J. L. ;Jim�nez, A. ;Calleja, E. ;Mu�oz, E. ;Oila, J. ;Saarinen, K. ;Hautoj�rvi, P.
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 98 KB
- Volume
- 180
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
GaN:Mg/AlGaN single heterostructures were grown on Si(111) substrates by plasma-assisted molecular beam epitaxy (PAMBE) leading to the fabrication of light emitting diodes (LEDs). p-type is successfully achieved using Mg, obtaining hole concentrations in the range of 1 Â 10 17 cm À3 . Although an intense and narrow (8 nm full width at half maximum) ultraviolet electroluminescence is observed under room temperature continuous-wave conditions, the electrical characteristics of the diode suffered mainly from a low p-type doping. In order to obtain higher hole concentrations and increase the performance of these devices, a study of the effects of Mg and Be co-doping is performed. Preliminary results show a decrease of the intensity of the yellow band in the photoluminescence spectra of co-doped samples in comparison with the Be-doped ones together with an increase of the intensity of the donor±acceptor pair related to the Be shallow acceptor. Both effects can be related to an increase in the p-type Be doping efficiency.
📜 SIMILAR VOLUMES
This work performs Si ion implantation to activate and convert the electrical conduction of p-GaN films from p-type to n-type. Multiple implantation method is used to form a uniform Si implanted region in the p-type GaN epitaxial layer. Implantation energies for the multiple implantation are 40, 100