✦ LIBER ✦

Study of a novel ALD process for depositing MgF2 thin films

✍ Scribed by Pilvi, Tero; Hatanpää, Timo; Puukilainen, Esa; Arstila, Kai; Bischoff, Martin; Kaiser, Ute; Kaiser, Norbert; Leskelä, Markku; Ritala, Mikko

Book ID: 120220346
Publisher: Royal Society of Chemistry
Year: 2007
Tongue: English
Weight: 438 KB
Volume: 17
Category: Article
ISSN: 0959-9428
DOI: 10.1039/B710903B

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Novel ALD Process for Depositing CaF 2 T

Novel ALD Process for Depositing CaF 2 Thin Films

✍ Pilvi, Tero; Arstila, Kai; Leskelä, Markku; Ritala, Mikko 📂 Article 📅 2007 🏛 American Chemical Society 🌐 English ⚖ 440 KB

Atomic Layer Deposition of MgF 2 Thin Fi

Atomic Layer Deposition of MgF 2 Thin Films Using TaF 5 as a Novel Fluorine Source

✍ Pilvi, Tero; Puukilainen, Esa; Kreissig, Ulrich; Leskelä, Markku; Ritala, Mikko 📂 Article 📅 2008 🏛 American Chemical Society 🌐 English ⚖ 980 KB

ChemInform Abstract: A New Process for D

ChemInform Abstract: A New Process for Depositing Tungsten Nitride Thin Films.

✍ J. P. LU; W. Y. HSU; J. D. LUTTMER; L. K. MAGEL; H. L. TSAI 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 31 KB 👁 2 views

The surface chemistry of thin film atomi

The surface chemistry of thin film atomic layer deposition (ALD) processes for electronic device manufacturing

✍ Zaera, Francisco 📂 Article 📅 2008 🏛 Royal Society of Chemistry 🌐 English ⚖ 571 KB

A Novel Simple Process for the Depositio

A Novel Simple Process for the Deposition of Thin Films of CuInSe2 by MOCVD

✍ John McAleese; Paul O′Brien; David J. Otway 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 246 KB 👁 2 views

Deposition of MgF2 thin films for antire

Deposition of MgF2 thin films for antireflection coating by using thermionic vacuum arc (TVA)

✍ Şadan Korkmaz; Saliha Elmas; Naci Ekem; Suat Pat; M. Zafer Balbağ 📂 Article 📅 2012 🏛 Elsevier Science 🌐 English ⚖ 804 KB