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Study of a Chemically Amplified Resist for X-ray Lithography by Fourier Transform Infrared Spectroscopy

✍ Scribed by Patran, A.; Tan, T.L.; Wong, D.; Lee, P.; Rawat, R.S.

Book ID: 115365043
Publisher: Society for Applied Spectroscopy
Year: 2004
Tongue: English
Weight: 148 KB
Volume: 58
Category: Article
ISSN: 0003-7028
DOI: 10.1366/0003702042475402

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