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FT-IR Study of a Chemically Amplified Resist for X-ray Lithography

✍ Scribed by Tan, T. L.; Kudryashov, V. A.; Tan, B. L.


Book ID
115364844
Publisher
Society for Applied Spectroscopy
Year
2003
Tongue
English
Weight
507 KB
Volume
57
Category
Article
ISSN
0003-7028

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