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Structure of amorphous carbon films

✍ Scribed by Bewilogua, K. ;Dietrich, D. ;Holzküter, G. ;Weissmantel, Ch.


Publisher
John Wiley and Sons
Year
1982
Tongue
English
Weight
143 KB
Volume
71
Category
Article
ISSN
0031-8965

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Amorphous carbon nitride films (a-CN x ) were deposited on Si(100) under different rf power and at different substrate temperature T S using rf magnetron sputtering of a high-purity graphite target in pure nitrogen. IR absorption, Raman spectra, and residual stress measurements are used to character