Structure and properties of silicon carbide grown on porous substrate by vacuum sublimation epitaxy
β Scribed by N. S. Savkina; V. V. Ratnikov; A. Yu. Rogachev; V. B. Shuman; A. S. Tregubova; A. A. Volkova
- Book ID
- 110131712
- Publisher
- Springer
- Year
- 2002
- Tongue
- English
- Weight
- 158 KB
- Volume
- 36
- Category
- Article
- ISSN
- 1063-7826
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Porous silicon (PSi) samples were prepared by electrochemical etching of silicon-on-insulator wafers, consisting of 45 m thick p-type (111) silicon epitaxial layer grown on a thin 100 nm SiO 2 layer on silicon substrates, by varying the concentration of 48% HF in ethanol solution. Within the epitaxi
## Abstract Structural defects of Ξ±βSiC epitaxial layers grown by sublimation βsandwichβmethodβ in vacuum at the temperatures ranging from 1600 to 2100 Β°C have been investigated by Xβray topography and optical microscopy methods. It was shown, that perfect SiC layers with the homogeneous polytype s