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Structure and optical properties of SiNx: H films with Si nanoclusters produced by low-frequency plasma-enhanced chemical vapor deposition

✍ Scribed by T. T. Korchagina; D. V. Marin; V. A. Volodin; A. A. Popov; M. Vergnat

Book ID: 111444486
Publisher: Springer
Year: 2009
Tongue: English
Weight: 201 KB
Volume: 43
Category: Article
ISSN: 1063-7826
DOI: 10.1134/s1063782609110207

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