𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Structure and morphology of aluminium doped Zinc-oxide layers prepared by atomic layer deposition

✍ Scribed by Zs. Baji; Z. Lábadi; Z.E. Horváth; I. Bársony

Book ID
113937391
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
709 KB
Volume
520
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The uniformity of Al distribution in alu
The uniformity of Al distribution in aluminum-doped zinc oxide films grown by atomic layer deposition
✍ G. Luka; L. Wachnicki; B.S. Witkowski; T.A. Krajewski; R. Jakiela; E. Guziewicz; 📂 Article 📅 2011 🏛 Elsevier Science 🌐 English ⚖ 929 KB

We investigated the aluminum distribution in aluminum-doped zinc oxide films grown by atomic layer deposition. Surface morphology, structure, composition and electrical properties of obtained films were studied. For the aluminum content less than 2 at.%, a periodicity of Al distribution along the la

Transparent and conductive undoped zinc
Transparent and conductive undoped zinc oxide thin films grown by atomic layer deposition
✍ Luka, Grzegorz ;Krajewski, Tomasz ;Wachnicki, Lukasz ;Witkowski, Bartlomiej ;Lus 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 582 KB

## Abstract Atomic layer deposition (ALD) was used to fabricate transparent and conductive thin films of ZnO. Two hundred‐nano metre thick ZnO films were deposited on glass substrates at low growth temperatures varied between 120 and 240 °C. As zinc and oxygen precursors we used diethylzinc (DEZn)