𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Structure and electrical properties of thin copper films deposited by MOCVD

✍ Scribed by J. Röber; C. Kaufmann; T. Gessner

Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
872 KB
Volume
91
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Deposition of electroceramic thin films
Deposition of electroceramic thin films by MOCVD
✍ J. Lindner; M. Schumacher; M. Dauelsberg; F. Schienle; S. Miedl; D. Burgess; E. 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 282 KB 👁 2 views

MOCVD (metal±organic chemical vapor deposition) of new materials, such as perovskite-type ceramic thin ®lms, will be a major key technology in the ®eld of ULSI non-volatile and volatile memory applications. This article outlines the latest trends in the ®eld of MOCVD equipment and process developmen

Electrical and Photoelectrical Propertie
Electrical and Photoelectrical Properties of Vacuum Deposited SnSe Thin Films
✍ D. Pathinettam Padiyan; A. Marikani; K.R. Murali 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 99 KB 👁 2 views

Polycrystalline thin films of tin selenide have been prepared by vacuum deposition at a substrate temperature of 150 o C and reported. X-ray diffraction, optical transmission, electrical conductivity and photoconductivity studies have been carried out on these films. Annealing the films at 300 o C f