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Structure and dielectric properties of ultra-thin ZrO2films for high-kgate dielectric application prepared by pulsed laser deposition

✍ Scribed by J. Zhu; Z.G. Liu

Publisher
Springer
Year
2004
Tongue
English
Weight
776 KB
Volume
78
Category
Article
ISSN
1432-0630

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Structure and dielectric properties of Zr–Al–O thin films prepared by pulsed laser deposition
✍ J. Zhu; Z.G. Liu πŸ“‚ Article πŸ“… 2003 πŸ› Elsevier Science 🌐 English βš– 147 KB

Zr-Al-O dielectric films have been deposited on Pt-coated silicon substrates and directly on n-type Si substrates, respectively, by pulsed laser deposition technique using a (ZrO ) (Al O ) ceramic target. The 2 0.5 2 3 0.5 Zr-Al-O films deposited in 20 Pa oxygen ambient at 300 8C substrate temperat