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Microstructures and dielectric properties of compositionally graded (Ba1-xSrx) TiO3thin films prepared by pulsed laser deposition

✍ Scribed by X. Zhu; S. Lu; H.L.W. Chan; C.L. Choy; K.H. Wong


Publisher
Springer
Year
2003
Tongue
English
Weight
1010 KB
Volume
76
Category
Article
ISSN
1432-0630

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Zr-Al-O dielectric films have been deposited on Pt-coated silicon substrates and directly on n-type Si substrates, respectively, by pulsed laser deposition technique using a (ZrO ) (Al O ) ceramic target. The 2 0.5 2 3 0.5 Zr-Al-O films deposited in 20 Pa oxygen ambient at 300 8C substrate temperat