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Structure and dielectric properties of amorphous LaAlO[sub 3] and LaAlO[sub x]N[sub y] films as alternative gate dielectric materials

✍ Scribed by Lu, Xu-bing; Liu, Zhi-guo; Wang, Yi-ping; Yang, Ying; Wang, Xiao-ping; Zhou, Hong-wei; Nguyen, Bich-yen


Book ID
120974742
Publisher
American Institute of Physics
Year
2003
Tongue
English
Weight
846 KB
Volume
94
Category
Article
ISSN
0021-8979

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