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Structural studies of thin silicon layers repeatedly implanted by carbon ions

✍ Scribed by K. Kh. Nusupov; N. B. Beisenkhanov; I. V. Valitova; E. A. Dmitrieva; D. Zhumagaliuly; E. A. Shilenko

Book ID
111445378
Publisher
SP MAIK Nauka/Interperiodica
Year
2006
Tongue
English
Weight
339 KB
Volume
48
Category
Article
ISSN
1063-7834

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## Abstract Hydrogenated amorphous and nanocrystalline silicon thin films deposited by hot wire (HW) and radio‐frequency plasma‐enhanced chemical vapour deposition (RF‐PECVD) were erbium‐implanted. Their pre‐implantation structural properties and post‐implantation optical properties were studied an