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Structural, optical and secondary electron emission properties of diamond like carbon thin films deposited by pulsed-DC plasma CVD technique

✍ Scribed by D.K. Rai; Debjit Datta; Sanjay K. Ram; Surajit Sarkar; Rajeev Gupta; Satyendra Kumar


Book ID
113914004
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
667 KB
Volume
12
Category
Article
ISSN
1293-2558

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In contrast with PECVD technology, reactive sputtering of graphite allows an independent control of the substrate bias. This characteristic permits the modification of film properties without varying the plasma composition. In the present study, the characteristics of DLC films grown by pulsed-DC re