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Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition

✍ Scribed by Nakazawa, Hideki; Miura, Soushi; Kamata, Ryosuke; Okuno, Saori; Suemitsu, Maki; Abe, Toshimi

No coin nor oath required. For personal study only.

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