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Structural effect on intrinsic stress in nanocrystalline Si:H films

✍ Scribed by Wensheng Wei; Jianling Su; Congliang Zhang; Liang Chu; Tianmin Wang

Book ID: 113940812
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 701 KB
Volume: 86
Category: Article
ISSN: 0042-207X
DOI: 10.1016/j.vacuum.2011.05.004

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