Depth distributions of hydrogen and intrinsic stress in a-Si:H films prepared from hydrogen-diluted silane

✍ Scribed by Danesh, P.; Pantchev, B.; Grambole, D.; Schmidt, B.

• Book ID: 121439745
• Publisher: American Institute of Physics
• Year: 2001
• Tongue: English
• Weight: 222 KB
• Volume: 90
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.1391223