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Structural defects and their electrical activity in germanium implanted silicon

✍ Scribed by J.P. Zhang; T.W. Fan; R.M. Gwilliam; P.L.F. Hemment; J.Q. Wen; Y. Qian; H. Efeoglu; J.H. Evans; A.R. Peaker

No coin nor oath required. For personal study only.

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