Structural characteristics of nanocrystalline copper after carbon ion implantation
โ Scribed by Wan-ming Lin; Ying-hui Wei; Hua-yun Du; Li-feng Hou; Guo-dong Wang; Hai-xiang Bi; Bing-she Xu
- Book ID
- 104057725
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 822 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0968-4328
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โฆ Synopsis
A gradient structure was produced in a pure copper plate by means of surface mechanical attrition treatment (SMAT). The microstructure of the surface layer was reduced to nanoscale and the grain size increased gradually along the depth of the treated sample. In situ transmission electron microscopy (TEM) and high resolution transmission electron microscopy (HRTEM) observation was performed on the nanocrystalline copper after implantation of carbon. Carbon atoms first precipitated along the edges of the copper substrate or at the surface, then formed amorphous carbon layers. Subsequently, onion-like fullerenes were formed under electron-beam irradiation. The effects of ion implantation, electron beam irradiation, nanostructure of the substrate and interaction of C and Cu atoms on the formation of the onion-like fullerenes are discussed.
๐ SIMILAR VOLUMES
A Raman spectroscopic study has been carried out on the effects of ion implantation of argon or nitrogen on the structures of ion-plated (IP) carbon films. The carbon films were deposited on WC substrates at room temperature, 200, 250, 300 and 350 ยฐC. Implantation of 150 keV Ar + or N into the films