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Structural and Physical Characteristics of PECVD Nanocrystalline Silicon Carbide Thin Films

✍ Scribed by J. Huran; A. Valovič; A.P. Kobzev; N.I. Balalykin; M. Kučera; Š. Haščík; Ľ. Malinovský; E. Kováčová

Book ID: 116833360
Publisher: Elsevier
Year: 2012
Tongue: English
Weight: 711 KB
Volume: 32
Category: Article
ISSN: 1875-3892
DOI: 10.1016/j.phpro.2012.03.560

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## Abstract Hydrogenated amorphous and nanocrystalline silicon thin films deposited by hot wire (HW) and radio‐frequency plasma‐enhanced chemical vapour deposition (RF‐PECVD) were erbium‐implanted. Their pre‐implantation structural properties and post‐implantation optical properties were studied an